Ga2O3 SEMICONDUCTOR ELEMENT

ABSTRACT

A semiconductor element includes a Molecular Beam Epitaxy (MBE)-grown channel layer including a β-Ga 2 O 3  single crystal layer. The MBE-grown channel layer is formed on a β-Ga 2 O 3  single crystal substrate.

The present application is a Continuation Application of U.S. patent application Ser. No. 15/250,262, filed on Aug. 29, 2016, which is a Continuation Application of U.S. patent application Ser. No. 14/343,686, filed on Mar. 7, 2014, now U.S. Pat. No. 9,461,124 B2, issued on Oct. 4, 2016, which is based on International Application No. PCT/JP2012/072902, filed on Sep. 7, 2012, which is based on Japanese Patent Application No. 2011-196440, filed on Sep. 8, 2011, the entire contents of which are incorporated herein by reference.

TECHNICAL FIELD

The invention relates to a Ga₂O₃-based semiconductor element.

BACKGROUND ART

A Ga₂O₃-based semiconductor element using a Ga₂O₃ crystal film formed on a sapphire substrate is known (see, e.g., NPLs 1 and 2).

CITATION LIST Non Patent Literature

[NPL 1]

K. Matsuzaki et al. Thin Solid Films 496, 2006, pp.37-41.

[NPL 2]

K. Matsuzaki et al. Appl. Phys. Lett. 88, 092106, 2006.

SUMMARY OF INVENTION Technical Problem

However, since the crystal structure of Ga₂O₃ crystal is completely different from that of sapphire crystal, it is very difficult to heteroepitaxially grow a Ga₂O₃ crystal on a sapphire substrate. Thus, it is difficult to form a high-quality Ga₂O₃-based semiconductor element by using a Ga₂O₃ crystal film grown on a sapphire substrate. It is an object of the invention to provide a high-quality Ga₂O₃-based semiconductor element.

Solution to Problem

According to one embodiment of the invention, a Ga₂O₃-based semiconductor element as defined in [1] to [4] below is provided so as to achieve the object.

[1] A Ga₂O₃-based semiconductor element, comprising:

-   -   a β-Ga₂O₃ substrate comprising a first conductivity type;     -   a β-Ga₂O₃ single crystal film formed on the β-Ga₂O₃ substrate         directly or via an other layer;     -   a source electrode formed on the β-Ga₂O₃ single crystal film;     -   a drain electrode formed on a surface of the β-Ga₂O₃ substrate         opposite to the β-Ga₂O₃ single crystal film;     -   a contact region formed in the β-Ga₂O₃ single crystal film,         connected to the source electrode and comprising the first         conductivity type; and     -   a gate electrode that is formed on the β-Ga₂O₃ single crystal         film or formed via a gate insulating film in a trench formed in         the β-Ga₂O₃ single crystal film.

[2] The Ga₂O₃-based semiconductor element according to [1], wherein the source electrode comprises first and second source electrodes,

-   -   wherein the gate electrode is formed via the gate insulating         film on a region between the first source electrode and the         second source electrode on the β-Ga₂O₃ single crystal film,     -   wherein the β-Ga₂O₃ single crystal film comprises the first         conductivity type,     -   wherein the contact region comprises first and second contact         regions connected to the first and second source electrodes,         respectively, and     -   wherein the semiconductor element further comprises first and         second body regions comprising a second conductivity type         different from the first conductivity type or a high resistance         and formed so as to surround the first and second contact         regions, respectively.

[3] The Ga₂O₃-based semiconductor element according to [1], wherein the β-Ga₂O₃ single crystal film is formed on the β-Ga₂O₃ substrate via an other β-Ga₂O₃ single crystal film comprising the first conductivity type,

-   -   wherein the β-Ga₂O₃ single crystal film comprises a second         conductivity type different from the first conductivity type or         includes no dopants,     -   the gate electrode is formed in the trench via the gate         insulating film, and     -   the contact region comprises first and second contact regions on         both sides of the gate electrode.

[4] The Ga₂O₃-based semiconductor element according to any one of [1] to [3], wherein the first and second conductivity types are an n-type and a p-type, respectively.

Advantageous Effects of Invention

According to an embodiment of the invention, a high-quality Ga₂O₃-based semiconductor element can be provided.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a cross sectional view showing a Ga₂O₃-based MISFET in a first embodiment.

FIG. 2 is a schematic structural diagram illustrating a structure of a MBE system in the first embodiment.

FIG. 3A is a cross sectional view showing an n-type β-Ga₂O₃ substrate and an n-type β-Ga₂O₃ single crystal film in the first embodiment.

FIG. 3B is a cross sectional view showing an n-type β-Ga₂O₃ substrate and an n-type β-Ga₂O₃ single crystal film in the first embodiment.

FIG. 4 is a cross sectional view showing a Ga₂O₃-based MISFET in a second embodiment.

FIG. 5 is a cross sectional view showing a Ga₂O₃-based MISFET in a third embodiment.

DESCRIPTION OF EMBODIMENTS

According to the present embodiment, it is possible to form a high-quality β-Ga₂O₃-based single crystal film by homoepitaxial growth and use of such a high-quality β-Ga₂O₃-based single crystal film allows a high-quality Ga₂O₃-based semiconductor element to be formed. Examples of embodiments thereof will be described in detail below.

First Embodiment

A Ga₂O₃-based MISFET (Metal Insulator Semiconductor Field Effect Transistor) having a planar gate structure will be described as the Ga₂O₃-based semiconductor element in the first embodiment.

(Structure of Ga₂O₃-Based Semiconductor Element)

FIG. 1 is a cross sectional view showing a Ga₂O₃based MISFET 20 in the first embodiment. The Ga₂O₃-based MISFET 20 includes an n-type β-Ga₂O₃ single crystal film 3 formed on an n-type βGa₂O₃ substrate 2, source electrodes 22 a and 22 b which are formed on the n-type β-Ga₂O₃ single crystal film 3, a gate electrode 21 formed on the n-type β-Ga₂O₃ single crystal film 3 via a gate insulating film 26 in a region between the source electrodes 22 a and 22 b, n-type contact regions 23 a and 23 b which are formed in the n-type β-Ga₂O₃ single crystal film 3 respectively under the source electrodes 22 a and 22 b, body regions 24 a and 24 b respectively surrounding the n-type contact regions 23 a and 23 b, and a drain electrode 25 formed on the n-type βGa₂O₃ substrate 2 on a surface opposite to the n-type β-Ga₂O₃ single crystal film 3.

The Ga₂O₃-based MISFET 20 is a vertical-type semiconductor element in which source and drain electrodes are arranged respectively on upper and lower sides of the element and a current flows in a vertical direction. When voltage of more than the threshold is applied to the gate electrode 21, channels are formed in regions of the p-type body regions 24 a and 24 b under the gate electrode 21 and a current thus flows from the source electrodes 22 a and 22 b to the drain electrode 25.

The n-type βGa₂O₃ substrate 2 includes an n-type dopant such as Si, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Ru, Rh, Ir, C, Sn, Ge, Pb, Mn, As, Sb, Bi, F, Cl, Br or I. The n-type β-Ga₂O₃ substrate 2 has a thickness of, e.g., 100 to 600 μm. In addition, the n-type β-Ga₂O₃ substrate 2 includes an n-type dopant at a concentration of, e.g., from 5×10¹⁸ to 1×10²⁰ /cm³.

Plane orientation of the main surface of the n-type β-Ga₂O₃ substrate 2 is not specifically limited but a plane rotated by not less than 50° and not more than 90° with respect a (100) plane is preferable. In other words, in the n-type βGa₂O₃ substrate 2, an angle θ (0<θ≤90°) formed between the main surface and the (100) plane is preferably not less than 50°. Examples of the plane rotated by not less than 50° and not more than 90° with respect the (100) plane include a (010) plane, a (001) plane, a (−201) plane, a (101) plane and a (310) plane.

When the main surface of the n-type β-Ga₂O₃ substrate 2 is a plane rotated by not less than 50° and not more than 90° with respect the (100) plane, it is possible to effectively suppress re-evaporation of raw materials of the β-Ga₂O₃-based crystal from the n-type β-Ga₂O₃ substrate 2 at the time of epitaxially growing the β-Ga₂O₃-based crystal on the n-type β-Ga₂O₃ substrate 2. In detail, where a percentage of the re-evaporated raw material during growth of the β-Ga₂O₃-based crystal at a growth temperature of 500° C. is defined as 0%, the percentage of the re-evaporated raw material can be suppressed to not more than 40% when the main surface of the n-type β-Ga₂O₃ substrate 2 is a plane rotated by not less than 50° and not more than 90° with respect the (100) plane. It is thus possible to use not less than 60% of the supplied raw material to form the β-Ga₂O₃-based crystal, which is preferable from the viewpoint of growth rate and manufacturing cost of the β-Ga₂O₃-based crystal.

The β-Ga₂O₃ crystal has a monoclinic crystal structure and typically has lattice constants of a=12.23 Å, b=3.04 Å, c=5.80 Å, α=γ=90° and β=103.7°. In the βGa₂O₃ crystal, the (100) plane comes to coincide with the (310) plane when rotated by 52.5° around the c-axis and comes to coincide with the (010) plane when rotated by 90°. Meanwhile, the (100) plane comes to coincide with the (101) plane or the (−201) plane depending on a rotation direction when rotated by 53.8° around the b-axis and comes to coincide with the (001) plane when rotated by 76.3° in the rotation direction in which the (010) plane appears by 53.8° rotation of the (100) plane.

Alternatively, the main surface of the n-type β-Ga₂O₃ substrate 2 may be a plane rotated at an angle of not more than 37.5° with respect to the (010) plane. In this case, it is possible to provide a steep interface between the n-type β-Ga₂O₃ substrate 2 and the i-type β-Ga₂O₃ single crystal film 3 and it is also possible to highly accurately control the thickness of the i-type β-Ga₂O₃ single crystal film 3.

The n-type β-Ga₂O₃ single crystal film 3 is a single crystal film formed on the n-type β-Ga₂O₃ substrate 2 by the below-described method. The n-type β-Ga₂O₃ single crystal film 3 includes azo n-type dopant such as Sn, Ti, Zr, Hf, V, Nb, Ta, Mo, W, Ru, Rh, Ir, C, Si, Ge, Pb, Mn, As, Sb, Bi, F, Cl, Br and I. The thickness of the n-type β-Ga₂O₃ single crystal film 3 is, e.g., 10 to 500 nm. In addition, the n-type β-Ga₂O₃ single crystal film 3 includes an n-type dopant at a concentration of, e.g., from 1×10¹⁵ to 1×10¹⁹/cm³.

Here, another film may be formed between the m-type β-Ga₂O₃ substrate 2 and the n-type β-Ga₂O₃ single crystal film 3. This other film is, e.g., an n-type β-Ga₂O₃ single crystal film having an n-type dopant concentration which is higher than the n-type β-Ga₂O₃ single crystal film 3, and in some cases, higher than the n-type β-Ga₂O₃ substrate 2. In this case, the other film is formed on the n-type β-Ga₂O₃ substrate 2 by homoepitaxial growth and the n-type β-Ga₂O₃ single crystal film 3 is formed on the other film by homoepitaxial growth.

The gate electrode 21, the source electrodes 22 a, 22 b and the drain electrode 25 are formed of, e.g., a metal such as Au, Al, Ti, Sn, Ge, In, Ni, Co, Pt, W, Mo, Cr, Cu. and. Pb, an alloy containing two or more of such metals, a conductive compound such as ITO, or a conductive polymer. Polythiophene derivatives (PEDOT: poly(3,4-ethylenedioxythiophene)) doped with polystyrene sulfonate (PSS) or polypyrrole derivatives doped with TCNA are used as the conductive polymer. In addition, the gate electrode 21 may have a two-layer structure composed of two different metals, e.g., Al/Ti, Au/Ni or Au/Co.

The gate insulating film 26 is formed of an insulating material such as SiO₂, AlN, SiN, Al₂O₃ or β-(Al_(x)Ga_(1-x))₂O₃ (0≤x≤1). Of those, β-(Al_(x)Ga_(1-x))₂O₃ can be grown as a single crystal film on a β-Ga₂O₃ crystal and thus allows a good semiconductor/insulating film interface with less interface states to be formed, resulting in better gate characteristics than when using other insulating films.

The contact regions 23 a and 23 b are regions having a high n-type dopant concentration formed in the n-type β-Ga₂O₃ single crystal film 3 and are respectively connected to the source electrodes 22 a and 22 b. The n-type dopant included in the contact regions 23 a and 23 b and the main n-type dopant included in the n-type β-Ga₂O₃ single crystal film 3 may be either the same or different.

The body regions 24 a and 24h include a p-type dopant such as Mg, H, Li, Na, K, Rb, Cs, Fr, Be, Ca, Sr, Ba, Rn, Mn, Fe, Co, Ni, Pd, Cu, Ag, Au, Zn, Cd, Hg, Tl, Pb, N or P. The body regions 24 a and 24 b are p-type regions or high resistance regions which behave like i-type due to charge compensation.

(Method of manufacturing Ga₂O₃-Based MISFET)

The method of manufacturing the β-Ga₂O₃-based single crystal film is PLD (Pulsed Laser Deposition), CVD (Chemical Vapor Deposition), sputtering or MBE (Molecular Beam Epitaxy) etc. In the present embodiment, a thin film growth method using the MBE is employed. The MBE is a crystal growth method in which a single or compound solid is heated in an evaporation source called cell and vapor generated by heat is supplied as a molecular beam onto the surface of the substrate.

FIG. 2 is a structural diagram illustrating an example of an MBE system used for forming the β-Ga₂O₃-based single crystal film. The MBE system 1 is provided with a vacuum chamber 10, a substrate holder 11 supported in the vacuum chamber 10 to hold the n-type β-Ga₂O₃ substrate 2, heating devices 12 held on the substrate holder 11 to heat the n-type βGa₂O₃ substrate 2, plural cells 13 (13 a, 13 b) each provided for each atom or molecule constituting a thin film, heaters 14 (14 a, 14 b) for hearing the plural cells 13, a gas supply pipe 15 for supplying oxygen-based gas into the vacuum chamber 10, and a vacuum pump 16 for exhausting the air in the vacuum chamber 10. It is configured that the substrate holder 11 can be rotated by a non-illustrated motor via a shaft 110.

A Ga raw material of the β-Ga₂O₃-based single crystal film, such as Ga powder, is loaded in the first cell 13 a. The Ga powder desirably has a purity of not less than 6N. Powder of an n-type dopant raw material to be doped as a donor is loaded in the second cell 13 b. A shutter is provided at an opening of each of the first cell 13 a and the second cell 13 b.

The preliminarily-formed n-type βGa₂O₃ substrate 2 is attached to the substrate holder 11 and a β-Ga₂O₃ crystal is then homoepitaxially grown on the n-type β-Ga₂O₃ substrate 2 while adding an n-type dopant, thereby firming the n-type β-Ga₂O₃ single crystal film 3.

The n-type βGa₂O₃ substrate 2 is made by, e.g., the following procedure. Firstly, an n-type β-Ga₂O₃ single crystal ingot doped with an n-type dopant such as Si is made by the EFG (edge-defined film-fed growth) method. It should be noted that an element to be added is not limited to Si. When substituting, e.g., Ga site, it is possible to use Ti, Zr, Hf, V, Nb, Ta, Mo, W, Ru, Rh, Ir, C, Sn, Ge, Pb, Mn, As, Sb or Bi. Meanwhile, it is possible to use F, Cl, Br or I when substituting oxygen site. For adding Si, SiO₂ powder is mixed to raw material powder. Not less than 0.05 mol % of SiO₂ is added to impart good conductivity to the n-type β-Ga₂O₃ substrate 2. The donor concentration in the n-type β-Ga₂O₃ single crystal ingot is, e.g., 5×10¹⁸ to 1×10 ²⁰/cm³. Alternatively, the n-type β-Ga₂O₃ single crystal ingot may be made by the FZ (floating zone) method. The obtained ingot is sliced to a thickness of, e.g., about 1 mm so that the main surface has a desired plane orientation, thereby forming a substrate. Then, a grinding and polishing process is performed to a thickness of about 100 to 600 μm.

Next, the n-type β-Ga₂O₃ substrate 2 made by the above procedure is attached to the substrate holder 11 of the MBE system 1. Next, the vacuum pump 16 is activated to reduce atmospheric pressure in the vacuum chamber 10 to about 10⁻⁸ Torr. Then, the n-type β-Ga₂O₃ substrate 2 is heated by the heating devices 12. Here, radiation heat of heat source such as graphite heater of the heating device 12 is thermally transferred to the n-type β-Ga₂O₃ substrate 2 via the substrate holder 11 and the n-type β-Ga₂O₃ substrate 2 is thereby heated.

After the n-type β-Ga₂O₃ substrate 2 is heated to a predetermined temperature, oxygen-based gas is supplied into the vacuum chamber 10 through the gas supply pipe 15.

After a period of time required for stabilization of gas pressure in the vacuum chamber 10 (e.g., after 5 minutes) since the oxygen-based gas was supplied into the vacuum chamber 10, the first cell 13 a and the second cell 13 b are respectively heated by the first heater 14 a and the second heater 14 b While rotating the substrate holder 11 so that Ga and n-type dopant are evaporated and are radiated as molecular beam onto the surface of the n-type β-Ga₂O₃ substrate 2.

For example, the first cell 13 a is heated to 900° C. and beam-equivalent pressure (BEP) of Ga vapor is 1×10⁻⁴ Pa.

As such, the βGa₂O₃ crystal is homoepitaxially grown on the main surface of the n-type β-Ga₂O₃ substrate 2 while being doped with the n-type dopant such as Sn and the n-type β-Ga₂O₃ single crystal film 3 is thereby formed. Growth temperature of the β-Ga₂O₃ crystal is, e.g., 700° C. It should be noted that as the n-type dopant other than Sn, it is possible to use Ti, Zr, Hf, V, Nb, Ta, Mo, W, Ru, Rh, Ir, C, Si, Ge, Pb, Mn, As, Sb and Bi, etc., for substituting Ga site and it is possible to use F, Cl, Br and I, etc., for substituting oxygen site. The addition concentration of the n-type dopant is selected from the range of, e,g., 1×10¹⁵ to 1×10¹⁹/cm³.

Alternatively, the n-type β-Ga₂O₃ single crystal film 3 may be formed by the PLD (Pulsed Laser Deposition) or the CVD (Chemical Vapor Deposition) etc.

FIGS. 3A and 3B are cross sectional views showing the n-type βGa₂O₃ single crystal film 3 in the present embodiment. The n-type β-Ga₂O₃ single crystal film 3 is formed on a main surface 2 a of the n-type β-Ga₂O₃ substrate 2 by the MBE mentioned above.

FIG. 3A shows the n-type β-Ga₂O₃ single crystal film 3 which is formed by continuously adding the n-type dopant during homoepitaxial growth of the β-Ga₂O₃ crystal.

The donor concentration in the n-type β-Ga₂O₃ single crystal film 3 is, e.g., 1×10¹⁵ to 1×10¹⁹/cm³ and is especially preferably 1×10¹⁵ to 1×10¹⁸/cm³. This donor concentration can be controlled by temperature of the second cell 13 b during film formation.

FIG. 3B shows the n-type β-Ga₂O₃ single crystal film 3 which is formed by intermittently adding the n-type dopant at certain intervals during homoepitaxial growth of the β-Ga₂O₃ crystal. In this case, Sn is used as the n-type dopant.

In detail, Sn vapor is intermittently generated from the second cell 13 b by operating the shutter of the second cell 13 b, thereby intermittently adding Sn to the β-Ga₂O₃ crystal. It is preferable that Sn be intermittently added twice or more. In this case, electrical conductivity according to the added amount of Sri can be imparted to the n-type β-Ga₂O₃ single crystal film 3 without performing annealing treatment.

Due to intermittent Sn addition, during the film formation, the n-type β-Ga₂O₃ single crystal film 3 in FIG. 3B has first layers 4 (4 a, 4 b, 4 c) grown during the period with no Sn addition and second layers 5 (5 a, 5 b, 5 c) gown during the period with Sn addition.

The Sn concentration in the second layer 5 can be controlled by temperature of the second cell 13 b during the film formation. The first layer 4, which ideally does not contain Sn, only contains a trace amount of Sn diffused from the second layer 5. Therefore, the Sn concentration in the first layer 4 is lower than that in the second layer 5. An average Sn concentration in the n-type β-Ga₂O₃ single crystal film 3 is, e.g., 1×10¹⁴ to 3×10¹⁸/cm³ and is especially preferably 1×10¹⁵ to 1×10¹⁸/cm³.

For example, the first layers 4 a, 4 b and 4 c are 3 to 20 nm in thickness and the second layers 5 a, 5 b and 5 c are 0.2 to 1 nm in thickness. If the thickness of the first layers 4 a, 4 b and 4 c is greater than 20 nm, the effect of providing the n-type may be reduced since intervals of the second layers 5 a, 5 b and 5 c are too large. On the other hand, if the thickness of the second layers 5 a, 5 b and 5 c is greater than 1 nm, the effect of intermittently providing the n-type may be reduced since the amount of Sn diffused from the second layers 5 a, 5 b and 5 c into the first layers 4 a, 4 b and 4 c is too large.

It should be noted that the lowermost layer of the n-type β-Ga₂O₃ single crystal film 3 (the layer in contact with the main surface 2 a of the n-typeβ-Ga₂O₃ substrate 2) may be either the first layer 4 or the second layer 5. In addition, the number of the first layers 4 and that of the second layers 5 are not limited.

After forming the n-type β-Ga₂O₃ single crystal film 3, the body regions 24 a and 24 b are formed by ion-implanting a p-type dopant such as Mg into the n-type β-Ga₂O₃ single crystal film 3. It should be noted that the ion to be implanted is not limited to Mg and, when substituting, e.g., Ga site, it is possible to use H, Li, Na, K, Rb, Cs, Fr, Be, Ca, Sr, Ba, Ra, Mn, Fe, Co, Ni, Pd, Cu, Ag, Au, Zn, Cd, Hg, Tl or Pb. In addition, it is possible to use N or P when substituting oxygen site. After implanting the p-type dopant, damage caused by implantation is repaired by performing annealing treatment.

It should be noted that the method of forming the body regions 24 a and 24 b is not limited to ion implantation and thermal diffusion process may be used. In this case, after metal such as Mg is brought into contact with the n-typeβ-Ga₂O₃ single crystal film 3 in a region for the body regions 24 a and 24 b to be formed, heat treatment is performed to diffuse a dopant such as Mg into the n-type β-Ga₂O₃ single crystal film 3.

Next, the contact regions 23 a and 23 b are formed by ion-planting the n-type dopant such as Sn into the body regions 24 a and 24 b of the n-typeβ-Ga₂O₃ single crystal film 3. It should be noted that the ion to be implanted is not limited to Sn and, when substituting, e.g., Ga site, it is possible to use Ti, Zr, Hf, V, Nb, Ta, Mo, Ru, Rh, Ir, C, Si, Ge, Pb, Mn, As, Sb or Bi. In addition, it is possible to use F, Cl, Br or I when substituting oxygen site. The implantation concentration is, e.g., not less than 1×10¹⁸/cm³ and not more than 5×10¹⁹ cm³. The implantation depth is not less than 30 nm. After implantation, the surface of the implanted region is etched about 10 nm by hydrofluoric acid. Sulfuric acid, nitric acid or hydrochloric acid may be used instead. After that, implantation damage is repaired by performing annealing treatment in a nitrogen atmosphere at not less than 800° C. for not less than 30 minutes. In case of performing the annealing treatment in an oxygen atmosphere, treatment temperature is not less than 800° C. and not more than 950° C. and treatment time is not less than 30 minutes.

It should be noted that the method of forming the contact regions 23 a and 23 b is not limited to ion implantation and thermal diffusion process may be used. In this case, after metal such as Sn is brought into contact with the n-type β-Ga₂O₃ single crystal film 3 in a region for the contact regions 23 a and 23 b to be formed, heat treatment is performed to diffuse a dopant such as Sn into the n-type β-Ga₂O₃ single crystal film 3.

After that, the gate insulating film 26, the gate electrode 21, the source electrodes 22 a, 22 b and the drain electrode 25 are formed.

Second Embodiment

A Ga₂O₃-based MISFET having a trench gate structure will be described as the Ga₂O₃-based semiconductor element in the second embodiment.

(Structure of Ga₂O₃-based MISFET)

FIG. 4 is a cross sectional view showing a Ga₂O₃-based MISFET 30 in the second embodiment. The Ga₂O₃-based MISFET 30 includes the n-type β-Ga₂O₃ single crystal film 3 formed on the n-type β-Ga₂O₃ substrate 2, an undoped β-Ga₂O₃ single crystal film 6 formed on the n-type β-Ga₂O₃ single crystal film 3, a gate electrode 31 which is covered with a gate insulating film 36 and is embedded in the undoped β-Ga₂O₃ single crystal film 6, contact regions 33 a and 33 b formed in the undoped β-Ga₂O₃ single crystal film 6 respectively on both sides of the gate electrode 31, a source electrode 32 which is formed on the undoped β-Ga₂O₃ single crystal film 6 and is connected to the contact regions 33 a and 33 b, and a drain electrode 35 formed on the n-type β-Ga₂O₃ substrate 2 on a surface opposite to the n-typeβ-Ga₂O₃ single crystal film 3.

The Ga₂O₃-based MISFET 30 is a vertical-type semiconductor element in which source and drain electrodes are arranged respectively on upper and lower sides of the element and current flows in a vertical direction. When voltage of more than the threshold is applied to the gate electrode 31, channels are formed in the undoped β-Ga₂O₃ single crystal film 6 on both sides of the gate electrode 31 and a current thus flows from the source electrode 32 to the drain electrode 35.

The gate electrode 31, the gate insulating film 36, the source electrode 32 and the drain electrode 35 are respectively formed of the same materials as the gate electrode 21, the gate insulating film 26, the source electrodes 22 (22 a, 22 b) and the drain electrode 25 in the first embodiment.

The undoped β-Ga₂O₃ single crystal film 6 is a high-resistance β-Ga₂O₃ single crystal film which does not include a dopant. Although there may be a ease where conductivity thereof is low due to crystal defects, etc., electric resistance thereof is sufficiently high and a current never flows from the source electrode 32 to the drain electrode 35 unless voltage is applied to the gate electrode 31. The undoped β-Ga₂O₃ single crystal film 6 has a thickness of, e.g., 0.1 to 100 μm.

The contact regions 33 (33 a, 33 b) include the same n-type dopant as the contact regions 23 (23 a and 23 b) of the first embodiment.

(Method of Manufacturing Ga₂O₃-Based MISFET)

Firstly, the n-type β-Ga₂O₃ substrate 2 and the n-type β-Ga₂O₃ single crystal film 3 are formed through the same processes as the first embodiment.

Next, a β-Ga₂O₃ single crystal is grown on the n-type β-Ga₂O₃ single crystal film 3 by the MBE without adding a dopant, thereby forming the undoped β-Ga₂O₃ single crystal film 6. The specific method of forming the undoped β-Ga₂O₃ single crystal film 6 is, e.g., based on the method of forming the n-type β-Ga₂O₃ single crystal film 3 where the process of implanting the n-type dopant is eliminated.

Next, a contact region is formed by ion-planting the n-type dopant such as Sn into the undoped β-Ga₂O₃ single crystal film 6. It should be noted that the ion to be implanted is not limited to Sn and, when substituting, e.g., Ga site, it is possible to use Ti, Zr, Hf, Nb, Ta, Mo, W, Ru, Rh, Ir, C, Si, Ge, Pb, Mn, As, Sb or Bi. In addition, it is possible to use F, Cl, Br or I when substituting oxygen site. The implantation concentration is, e.g., not less than 1×10¹⁸/cm³ and not more than 5×10¹⁹ cm³. The implantation depth is not less than 30 nm. After implantation, the surface of the implanted region is etched about 10 nm by hydrofluoric acid. Sulfuric acid, nitric acid or hydrochloric acid may be used instead. After that, implantation damage is repaired by performing annealing treatment in a nitrogen atmosphere at not less than 800° C. for not less than 30 minutes. In case of performing the annealing treatment in an oxygen atmosphere, treatment temperature is not less than 800° C. and not more than 950° C. and treatment time is not less than 30 minutes.

It should be noted that the method of forming the contact region is not limited to ion implantation and thermal diffusion process may be used. In this case, after metal such as Sn is brought into contact with the undoped β-Ga₂O₃ single crystal film 6 in a region for the contact region to be formed, heat treatment is performed to diffuse a dopant such as Sn into the undoped β-Ga₂O₃ single crystal film 6.

Next, the surface of the undoped β-Ga₂O₃ single crystal film 6 in the region having the contact region is dry-etched to form a trench and the gate electrode 31 covered with the gate insulating film 36 is embedded in the trench. Here, the contact region is divided into the contact regions 33 a and 33 b by forming the trench.

In detail, for example, the gate insulating film 36 is formed on bottom and side surfaces of the trench by deposition method and etching, the gate electrode 31 is then formed thereon by deposition method and etching and the gate insulating film 36 is lastly formed on the gate electrode 31 by deposition method and etching.

After that, the source electrode 32 and the drain electrode 35 are formed.

Third Embodiment

The third embodiment is different from the second embodiment in that a p-type β-Ga₂O₃ single crystal film is formed instead of the undoped β-Ga₂O₃ single crystal film 6. The explanations for the same features as the second embodiment will be omitted or simplified.

(Structure of Ga₂O₃-Based MISFET)

FIG. 5 is a cross sectional view showing a Ga₂O₃-based MISFET 40 in the third embodiment. The Ga₂O₃-based MISFET 40 includes the n-type βGa₂O₃ single crystal film 3 formed on the n-type β-Ga₂O₃ substrate 2, a p-type β-Ga₂O₃ single crystal film 7 formed on the n-type β-Ga₂O₃ single crystal film 3, the gate electrode 31 which is covered with a gate insulating film and is embedded in the p-type β-Ga₂O₃ single crystal film 7, the contact regions 33 a and 33 b formed in the p-type β-Ga₂O₃ single crystal film 7 respectively on both sides of the gate electrode 31, the source electrode 32 which is formed on the p-type β-Ga₂O₃ single crystal film 7 and is connected to the contact regions 33 a and 33 b, and the drain electrode 35 formed on the n-type β-Ga₂O₃ substrate 2 on a surface opposite to the n-type β-Ga₂O₃ single crystal film 3.

The Ga₂O₃-based MISFET 40 is a vertical-type semiconductor element in which source and drain electrodes are arranged respectively on upper and lower sides of the element and current flows in a vertical direction. When voltage of more than the threshold is applied to the gate electrode 31, channels are formed in the p-type β-Ga₂O₃ single crystal film 7 on both sides of the gate electrode 31 and a current thus flows from the source electrode 32 to the drain electrode 35.

The p-type β-Ga₂O₃ single crystal film 7 includes a p-type dopant such as Mg, Li, Na, K, Rb, Cs, Fr, Be, Ca, Sr, Ba, Ra, Mn, Fe, Co, Ni, Pd, Cu, Ag, Au, Zn, Cd, Hg, Tl, Pb, N or P. The p-type β-Ga₂O₃ single crystal film 7 has a thickness of, e.g., 0.1 to 100 μm. In addition, the p-typeβ-Ga₂O₃ single crystal film 7 includes a p-type dopant at a concentration of, e.g., from 1×10¹⁵ to 1×10¹⁹/cm³.

Since the p-type β-Ga₂O₃ single crystal film 7 which is a p-type layer is used as a channel layer, the Ga₂O₃-based MISFET 40 has a higher threshold voltage than the Ga₂O₃-based MISFET 30.

The p-type β-Ga₂O₃ single crystal film 7 is formed by growing a β-Ga₂O₃ single crystal on the n-type β-Ga₂O₃ single crystal film 3 while adding a p-type dopant such as Mg. It should be noted that the ion to be added is not limited to Mg and, when substituting, e.g., Ga site, it is possible to use H, Li, Na, K, Rb, Cs, Fr, Be, Ca, Sr, Ba, Ra, Mn, Fe, Co, Ni, Pd, Cu, Ag, Au, Zn, Cd, Hg, Tl or Pb. In addition, it is possible to use Nor P when substituting oxygen site.

Effects of the Embodiments

According to the present embodiments, it is possible to form high-quality β-Ga₂O₃ single crystal films by homoepitaxial growth and use of such β-Ga₂O₃ single crystal films allows high-quality Ga₂O₃-based semiconductor elements to be formed. In addition, these Ga₂O₃-based semiconductor elements have excellent performance since a high-quality β-Ga₂O₃ single crystal film is used as a channel layer.

It should be noted that the invention is not intended to be limited to the above-mentioned embodiments, and the various kinds of modifications can be implemented without departing from the gist of the invention. For example, the Ga₂O₃-based semiconductor element has been described as the n-type semiconductor element in the embodiments but may be a p-type semiconductor element. In this case, the conductivity type (n-type or p-type) of each member is all inverted.

In addition, constituent elements of the above-mentioned embodiments can be arbitrarily combined without departing from the gist of the invention.

Although the embodiments of the invention have been described above, the invention according to claims is not to be limited to the above-mentioned embodiments. Further, it should be noted that all combinations of the features described in the embodiments are not necessary to solve the problem of the invention.

INDUSTRIAL APPLICABILITY

A high-quality Ga₂O₃-based semiconductor element is provided.

REFERENCE SIGNS LIST

1: MBE system

2: n-type rβ-Ga₂O₃ substrate

3: n-type β-Ga₂O₃ single crystal film

6: undoped β-Ga₂O₃ single crystal film

7: p-type β-Ga₂O₃ single crystal film

20, 30, 40: Ga₂O₃-based MISFET

21, 31: gate electrode

22 a, 22 b, 32: source electrode

25, 35: drain electrode

26, 36: gate insulating film

23 a, 23 b, 33 a, 33 b: contact region

24 a, 24 b: body region 

What is claimed is:
 1. A semiconductor element, comprising; a Molecular Beam Epitaxy (MBE)-grown channel layer consisting of a β-Ga₂O₃ single crystal layer, wherein the MBE-grown channel layer is formed on a β-Ga₂O₃ single crystal substrate.
 2. The semiconductor element according to claim 1, wherein a main surface of the β-Ga₂O₃ single crystal substrate includes a plane rotated by not less than 50°0 and not more than 90° around a b-axis or a c-axis with respect to a (100) plane.
 3. The semiconductor element according to claim 1, wherein the β-Ga₂O₃ single crystal layer comprises a p-type dopant.
 4. A semiconductor element according to claim 3, wherein the semiconductor element includes a type of a normally-off transistor. 